NIL Technology - Nanoimprint Lithography

NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern. The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.

Product Index:

- Stamps, Masters & Shims

- Standard Stamps

- Nanoimprint Lithography (NIL) Tools

Stamps, Masters & Shims

By Material		By Application
Silicon NIL Stamps Silicon nanoimprint lithography stamps are used for thermal nanoimprint lithography or as masters for polymer stamp production. NILT delivers silicon stamps with any pattern specified by the customer with a resolution down to below 20 nm and with aspect ratios up to 1:10.		Microlens Array Custom Stamp Stamps with concave or convex microlens arrays for use in the production by hot-embossing or injection molding.
Fused Silica NIL Stamps Fused silica nanoimprint lithography stamps are used for UV nanoimprint lithography. NILT delivers fused silica stamps with any pattern specified by the customer with a resolution down to below 30 nm and with aspect ratios up to 1:5.		Microfluidics and LOC Shims Custom made shims in Nickel for production of microfluidic and lab-on-a-chip (LOC) systems by hot-embossing or injection moulding.
Nickel Shims Nickel shims are used for thermal imprinting and roll-to-roll setups. NILT delivers nickel stamps with a size up to 600 mm x 600 mm and a thickness down to 50 µm. The nickel shim can be patterned with micro structures and nano structures.
PDMS NIL Stamps PDMS stamps are casted from silicon or fused silica masters. NILT delivers PDMS stamps with any pattern specified by the customer with a resolution down to 100 nm and with an aspect ratio up to 1:2.
Polymer NIL Stamps Polymer nanoimprint lithography stamps are made from silicon or fused silica masters, typically by a thermal Nanoimprint lithography process. NILT delivers polymer stamps in any polymer and with any pattern specified by the customer. The minimum resolution i 50 nm and the aspect ratio can be up to 1:3.
65-Stamps 65-Stamps are made of fused silica and are used for UV step-and-repeat processes. NILT delivers 65-stamps with any pattern specified by the customer with a resolution down to 50 nm and with aspect ratios up to 1:5.

Standard Stamps

Microlens Array The Microlens Array Standard Stamp contains closely packed microlens structures arranged in a honeycomb geometry with three dimensional intersections between the individual lenses.		Linear and Circular Engineered Diffusers The ED standard stamp series is specifically designed as a set of multi-purpose engineered diffusers for R&D work, as well as for product and process development. Read more
Wire Grid Polarizer The Wire Grid Polarizer Standard Stamp is ideal for production of wire grid polarizers by nanoimprint lithography for test purposes. The stamp features a large active area of 12 mm x 12 mm with 50 nm lines and spaces.		Grating The Grating Standard Stamp is a low-cost standard stamp with periodic line and pillar grating patterns and customers can choose among different variants with different specifications.
Anti-Reflective The Anti-Reflective Standard Stamp is a large area and cost-effective functional standard stamp in Nickel with a graded index profile and with a continuously changing effective refractive index.		Multi-Pattern The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm.
Sub-Micro The Sub-Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns at 4 different dimensions.		Large Area Pillar The Large Area Pillar Standard Stamp is a high-quality standard stamp in Silicon with large patterned area of photonic crystal and anti-reflective structures. It has 4 areas, each 1 cm x 1 cm, with square arrays of pillars.
Micro Test This stamp is well suited for process testing within the fields of nanoimprint lithography and hot embossing. The stamp features arrays of square pillars/holes having a size of 3, 5, 10 and 20 µm. Read more		Micro The Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 3 different patterns at 3 different dimensions. Read more
65 The 65 Standard Stamp is optimal for testing of the nanoimprint processes and testing of NIL equipment using this particular stamp format. The stamp comes with line widths down to 100 nm.		Micro-needle The micro-needle standard stamp contains the inverse structure of micro-needles — i.e. micro-needle shaped holes. The micro-needle standard stamp can be used to produce micro-needles either by hot-embossing or casting.
Diffraction Grating The Diffraction Grating standard stamps are large area stamps in Nickel with linear gratings or with crossed gratings. The pitch of the gratings is in both cases 500 nm and the average depth of the gratings is 250 nm.

Nanoimprint Lithography (NIL) Tools

CNI - Thermal NIL Tool	EZI - UV NIL Tool	NIL Simulation Software
Imprinting is all about replication and production of identical devices and samples containing micro and nano-scale structures. The CNI tool is a desktop pattern replication system, providing easy access to replication of functional patterns and structures fast and cost-efficiently.	The EZImprinting (EZI) Nanoimprint Technology Platform (NTP) is a standalone nanoimprint station including a nanoimprint module with AutoRelease™ function and an automatic imprint controller.	To support nanoimprint users and save valuable time in the laboratory on optimization of the imprint parameters, NILT offers the Simprint Simulation Software. The software provides simulations of Residual Layer Thickness (RLT) variations and assists the user in identifying optimal process parameters.

Simprint Core v2.1 - Simulation Software

Key features:

Residual layer thickness simulation
Fast full-chip simulation
Support of UV-NIL and thermal NIL
Simulate impact of rough substrates