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Teltec Pacific is a technical Sales and Service organisation serving the Semiconductor, Photonics and Optoelectronics Industries in Asia Pacific countries.

Photolighography / Coating

Denton Vacuum located in Philadelphia, USA, is a world-renowned vacuum coating equipment manufacturers. Since 1964, Denton has custom-made thousand sets of evaporation, sputtering and PECVD coating systems, with unique specifications for her customers. Denton’s customers include leading industrial companies as well as most leading universities and research facilities worldwide.

 

Read the Technical Paper:
Thickness Distribution of Evaporated Films

The emission distribution characteristics of an evaporation source can be used to define the correct geometry in the vacuum chamber for the production of uniform-thickness coatings.

Producing a coating of uniform thickness over a large aperture substrate, or over a rack loaded with many small substrates, can be done by making repeated trials with the rack loaded with test pieces. From one trial run to the next, the geometry is intentionally changed - the evaporation source offset increased, for example - until the best arrangement is found.

In this paper, we first measured the thickness of coatings on test pieces positioned at known radial distances on a single rotation flat rack in the vacuum evaporation chamber and used these data to find the source emission function. The known emission function was then used to determine the source offset and calotte curvature, which produced the best thickness uniformity over the diameter. 

 

Read the
                                                          Paper Now

 

Lower Cost of Ownership...Higher ROI 

Ion Assisted Deposition provides high-quality, defect-free, low stress, environmentally-stable (shift-free) films that are required by the most demanding optical applications. 

You’ll benefit from:

  • Independent control of ion current density and ion energy to optimize film properties

  • Long-term operation with 100% O2 or N2 reactive gases for stable operation with no process drift for extended runs

A cold cathode ion source is a differentially pumped device with one end of the plasma chamber open to the vacuum environment. The operational parameters of the ion source and the quality of the films are affected by the parameters controlling the vacuum level. It’s much easier to make good films in systems with high pumping speeds. When comparing IAD film deposition parameters, differences in pressure may be due to the pumping speed.

To read about the effects of pumping speed on the cold cathode ion source, download our technical paper.

 

Explorer THIN FILM DEPOSITION PLATFORM

 


 

Denton’s most popular, flexible system, the high vacuum EXPLORER can be equipped for thermal evaporation, e-beam evaporation, sputtering, or even PECVD in order to perform research, development and production.

 

TYPICAL APPLICATIONS :
- PECVD

• Materials Research
• Small Batch Systems
• 3D Objects
• Coat a Variety of Materials

 


- SPUTTERING
• Materials research
• Product QC & QA
• Semiconductor Failure Analysis
• CD Mastering
• Nanotechnology
• Compound Semiconductors
• OLEDs

- EVAPORATION
• Materials Research
• Ion Assisted Deposition (IAD)
• Medical Devices
• Telecommunications
• CD Mastering
• Lift-Off
• Protective Coating

 

CAPABILITIES & FEATURES :
• Thermal & E-Beam Evaporation
• Ion Beam Assisted Deposition
• DC/Pulse DC/RF Sputtering & Co-sputtering
• Base Vacuum in the 10-6 torr scale range
• 8" (200 mm) Substrate Size or Larger
• Load Lock Option
• PECVD Process Options

 

DV-502 HIGH VACUUM EVAPORATOR PLATFORM

 

 

With rapid cycle times, on-board deposition control and a large deposition zone, the DV-502 gives users a flexible, high vacuum evaporation or sputtering system equipped for a wide range of applications.

 

TYPICAL APPLICATIONS :
- EVAPORATION

• High vacuum carbon coating for 

     TEM & X-ray analysis
• Carbon support films
• Carbon platinum replicas
• Aperture cleaning
• Rotary shadowing
• Asbestos analysis
• Resistance evaporation
• Failure analysis
• High purity ultra thin films

 

 

CAPABILITIES & FEATURES :
• High Vaccum Gate Valve for Rapid Cycling
• Diffusion or Turbo-moloecular Pump Options
• Dedicated Sputtering or Evaporation Capability
• Integrated Thickness Monitors and Controllers
• AC Glow for Sample CLeaning
• Base Vacuum in the 10-6 torr scale range
• 6" (150 mm) Diameter Substrate Size

 

Desktop Pro COMPACT, HIGH PERFORMANCE SPUTTERING PLATFORM

 

 

 

With two sputtering cathodes and a turbo-molecular pump, the DESKTOP PRO is a compact, high vacuum platform for research, production support and sample preparation.

 

TYPICAL APPLICATIONS :
- SPUTTERING

• Materials Research
• Product QC & QA
• Semiconductor failure analysis
• Nanotechnology
• Compound semiconductors

 

CAPABILITIES & FEATURES :
• DC and RF Sputtering
• One or Two Cathode Configuration
• Co-sputtering Capable
• Base Vacuum in the 10-6 torr scale range
• 6” (150 mm) Diameter Substrate Size

 

Desk V HP COLD SPUTTERING PLATFORM

 

 

A sputtering system that can be also equipped for carbon evaporation, the DESK V HP is the global standard for electron microscopy sample preparation. The DESK V Series includes standard systems, high power systems and turbo pumping systems.

 

TYPICAL APPLICATIONS :
- SPUTTERING

• Iridium coating capabilities
• TEM sample preparation
• SEM sample preparation
• Field emission (FE) SEM sample

     preparation

 

CAPABILITIES & FEATURES :
• DC Sputtering
• Carbon Evaporation
• 4” (100 mm) Diameter Substrate Size